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International Journal of Scientific and Engineering Research
ISSN Online 2229-5518
ISSN Print: 2229-5518 2    
Website: http://www.ijser.org
scirp IJSER >> Volume 3,Issue 2,February 2012
Photolithographic Techniques for LSI & VLSI
Full Text(PDF, )  PP.443-447  
Author(s)
M.G.WANI
KEYWORDS
Optical Lithography, Proximity Pringing, Contact Printing, Projection Printing, Electron Beam Lithography-ray Lithography.
ABSTRACT
Writing the patterns of the Electronics of a digital computer on a minute silicon crystal of 0.2 square inch area.. This thin minute crystal slice (chip) contains 512,000 transistors other resistor capacitor components. Writing the pattern is just the start subsequent processing involves several other steps.
References
[1] D.H. Scheiber and R. M. Rosenberg, ― Circuitry from Photoprintable Paste; A New Technology,‖ in Proc. 1972 Int. Microelectronics Symp., p. 4-A-3-1.

[2] D.H. Scheiber and R. V. Weaver, ― Circuitry from Photoprintable Pastes: FODEL Photoprintable Dieletectric Composition.‖ in Proc. 1973 Int. Microelectronic Symp., p. 3A – 3 -1.

[3] D. M. Gibson, ― A Method for Thick Film Printing of Conductor Fine Lines and Spacing,‖ ISHM‘77.

[4] L. R. Fletcher, ― Thick – Film Applications in Hybrid Microwave Substate Fabrication,‖ preseted at the 1976 Int. Microelectronics Symp.

[5] R. P. Mandal,‖ Evaluation of Advanced Microelectronic Fluxless Solder Bump Contacts for Hybrid Microcircuits,‖ NASA Contractor Rep. NAS 8-3 1496, June 1970.

[6] Electronics for you. July 1986 to October 1986.

[7] Guthikonda V. Rao., Microprocessors and Microcomputer Systems., (IInd edition)

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