The Effect of Manganese percentage doping on the Thickness and Conductivity of Copper sulphide nanofilms prepared by Electrodeposition method [ ]


Manganese doped copper sulphide nanofilms were prepared using aqueous solution of zinc chloride, manganese chloride, sodium thiosulphate and triethanolamine as a complexing agent by electrodeposition method. The experiment was carried out at room temperature and optimum deposition condition with the manganese percentage doping varied from 3% to 23%. The XRD pattern revealed that Mn doped CuS nanofilms have cubic structure with mean crystallite size of approximately 2.7937nm.The thickness and conductivity of CuS:Mn films were determined by optical method. Results from our investigation revealed that with the increasing of Mn percentage doping from 3% to 23%, the thickness of the CuS:Mn films ranged from 4.23 – 18.49nm, absorption coefficient from 0.20 x 105 to 1.0 x 105, optical conductivity from 3.0 x1012 to 5.50 x1012 and electrical conductivity from 1.53 x 102 to 1.58 x 102. Such CuS:Mn films in nanometer size range and of high conductivity could be suitable for applications in the fabrications of thin films solar cells and various optoelectronic devices.